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Titanium Nitride (titanium + nitride)

Distribution by Scientific Domains

Polymers and Materials Science	41%
Chemistry	29%
Medical Sciences	23%

Selected Abstracts

Novel Method to Prepare Electroconductive Titanium Nitride,Aluminum Oxide Nanocomposites

JOURNAL OF THE AMERICAN CERAMIC SOCIETY, Issue 3 2002
Jingguo Li
A novel method for the preparation of TiN,Al2O3nanocomposites was developed. TiN,Al2O3nanocomposite powders were prepared by the direct nitridation of TiO2,Al2O3nanocomposite powders that were derived from the simultaneous hydrolysis of tetra-butyl titanate and precipitation of aluminum nitrate. Dense sintered bodies of these TiN,Al2O3nanocomposite powders were obtained by hot pressing at 1450°,1650°C and 30 MPa for 60 min. The resistivity of nanocomposite reaches a minimum (1.5 × 10,3,·cm) at 25 vol% TiN additions. The percolation concentration of nanocomposite is ,10 vol% TiN. [source]

Carbon Nanotubes with Titanium Nitride as a Low-Cost Counter-Electrode Material for Dye-Sensitized Solar Cells,

ANGEWANDTE CHEMIE, Issue 21 2010
Guo-ran Li Dr.
Ein ideales Paar: Die Photovoltaikleistung von Kohlenstoffnanoröhren mit Titannitridnanopartikeln (TiN-CNTs; siehe Bild) ähnelt derjenigen herkömmlicher Platin-Gegenelektroden. Dieses Resultat wird mit der idealen Kombination der überlegenen elektrokatalytischen Aktivität von TiN-Nanopartikeln mit der hohen elektrischen Leitfähigkeit von CNTs begründet. [source]

Atomic Vapor Deposition of Titanium Nitride as Metal Electrodes for Gate-last CMOS and MIM Devices

CHEMICAL VAPOR DEPOSITION, Issue 5-6 2008
Mindaugas Lukosius
Abstract Pure and diluted Ti[N(Et)2]4 precursors are used to grow TiN layers at 400,600,°C by using atomic vapor deposition (AVD®). The composition, microstructure, and electrical properties of TiN films with various thicknesses are investigated. The determined work function of 4.7,eV indicates the possibility of using AVD®-grown TiN as a metal gate electrode for PMOSFET and metal-insulator-metal (MIM) devices. TiN/HfO2/SiO2 stacks are integrated into gate-last PMOS transistors, and the extracted parameters are compared to poly-Si/SiO2 reference transistors. The optimized films grown at 400,°C with a thickness of 20,nm exhibit a resistivity of 400,µ,,cm. [source]

Small Cluster Models of the Surface Electronic Structure and Bonding Properties of Titanium Carbide, Vanadium Carbide, and Titanium Nitride

CHEMINFORM, Issue 4 2004
Stephen V. Didziulis
Abstract For Abstract see ChemInform Abstract in Full Text. [source]

Evaluation of Thin Film Titanium Nitride Electrodes for Electroanalytical Applications

ELECTROANALYSIS, Issue 10 2007
Carolina Nunes, Kirchner
Abstract Titanium nitride is a hard and inert conducting material that has yet not been widely used as electrode material for electroanalytical applications although there are highly developed protocols available to produce well adherent micro and nanostructured electrodes. In this paper the possibilities of using titanium nitride thin films for electroanalytical applications is investigated. Scanning electrochemical microscope (SECM) was used for analysis of the redox kinetics of a selected fast redox couple at thin films of titanium nitride (TiN) in different thicknesses. The investigation was carried out by approaching an amperometric ultramicroelectrode (UME) to the TiN film while the soluble redox couple (ferrocenemethanol/ferrociniummethanol) served as mediator in a SECM configuration. The substrate was biased at a potential so that it rereduces the species being produced at the UME, thus controlling the feedback effect. Normalized current,distance curves were fitted to the theoretical model in order to find the apparent heterogeneous standard rate constant (k°) at the sample. The data are further supported by structural investigation of the TiN films using scanning force microscopy and X-ray photoelectron spectroscopy. It was found that the kinetics are little influenced by prolonged storage in air. The heterogeneous standard rate constants in 2,mM ferrocenemethanol were (0.73±0.05)×10,3,cm s,1 for 20,nm TiN thin layer, (1.5±0.2)×10,3,cm s,1 for 100,nm TiN thin layer and (1.3±0.2)×10,3,cm s,1 for 300,nm TiN thin layer after prolonged storage in air. Oxidative surface treatment (in order to remove organic adsorbates) decreased the kinetics in agreement with a thicker oxide layer on the material. The results suggest that their direct use for amperometric detection of reversible redox systems in particular at miniaturized configurations may be advantageous. [source]

Adhesive bonding of titanium nitride-plated stainless steel for magnetic attachments

EUROPEAN JOURNAL OF ORAL SCIENCES, Issue 3 2001
Yohsuke Taira
The purpose of this study was to evaluate adhesive bonding of resin to titanium nitride ion-plated stainless steel in order for magnetic attachments to survive in the oral environment. Two primers, Cesead II Opaque Primer (CPII) and Metal Primer II (MPII), and one bonding agent, Super-Bond C&B (SB), were used. The surfaces of stainless steel disks were ground and then plated with titanium nitride. After the primer and SB resin were applied, a self-curing resin was bonded to the metal surfaces. Shear bond strengths were determined after 24 h of water storage and after 2,000 thermocycles. Titanium nitride ion-plated stainless steel showed bond strength comparable to the non-plated material. After thermocycling, all specimens of the group no primer/no SB were debonded. The bond strengths of groups CPII/no SB, MPII/no SB and no primer/SB were significantly lower bond strengths than groups CPII/SB and MPII/SB. An appropriate combination of primer and bonding agent should be selected when bonding a magnetic attachment to the denture base. [source]

Evaluation of Thin Film Titanium Nitride Electrodes for Electroanalytical Applications

Fabrication of Load-Bearing NiTi Scaffolds for Bone Ingrowth by Ni Foam Conversion,

ADVANCED ENGINEERING MATERIALS, Issue 7 2010
Irena Gotman
Highly porous NiTi scaffolds for bone ingrowth were fabricated by reactive conversion (PIRAC) of commercially available Ni foams. These open cell ,trabecular NiTi' scaffolds possess high strength and ductility and exhibit low Ni ion release. PIRAC deposition of a thin titanium nitride (TiN) layer further improves the corrosion characteristics of "trabecular NiTi" and allows for material bioactivation by alkali treatment or biomimetic Ca phosphate deposition. [source]

Adhesive bonding of titanium nitride-plated stainless steel for magnetic attachments

Dual Templating Synthesis of Mesoporous Titanium Nitride Microspheres,

ADVANCED MATERIALS, Issue 31 2009
Jin Ho Bang
Hierarchically nanostructured titanium nitride is prepared via a novel and facile in situ dual templating approach. No prestructured templates are necessary; instead, a template is generated in situ during the synthesis from a liquid core and the resulting spherical shell, and the template is removed in the final heating without any additional chemical etching. [source]

Abrasion resistance of titanium nitride coatings formed on titanium by ion-beam-assisted deposition

JOURNAL OF ORAL REHABILITATION, Issue 2 2005
T. SAWASE
summary, To improve the physical properties of the pure titanium surface, thin titanium nitride (TiN) films were deposited by means of ion-beam-assisted deposition. Film structure was confirmed as TiN by X-ray diffraction analysis. Surface hardness and abrasion resistance were significantly improved on TiN-coated specimens. Five combinations of oral hygiene instruments and materials were applied to the specimens as simulations of the oral environment. Treatment with the metal scaler and ultrasonic scaler severely changed the surface features and significantly increased the surface roughness parameters on pure titanium controls, whereas only small scratches and dull undulations were seen on the TiN-coated specimens. Profilometric tracings and scanning electron micrographs demonstrated the improved abrasion resistance of the TiN-coated specimens. [source]

Photoluminescence from Boron-Doped Titanium Nitride Nanocomposite Thin Films Prepared by the Magnetron Sputtering Method

JOURNAL OF THE AMERICAN CERAMIC SOCIETY, Issue 12 2007
Sheng-Guo Lu
Boron-doped titanium nitride (TiBN) thin films with nanosized grains were prepared by a magnetron sputtering method. X-ray diffraction and transmission electron microscopy observation indicated that TiBN thin films have a cubic structure with grains ,5 nm in size. The photoluminescence (PL) of the films was investigated as a function of temperature over a wavelength range of 350,900 nm. Two PL peaks near 3.20 and 2.38 eV were conisdered to have resulted from the recombination of the donor-bound excitons and deep-trap defects with the holes in the valence band, respectively. An energy transfer from bound electrons to deep-trap defects was observed in the nanocomposite thin film. [source]

Impeding corrosion of sintered NdFeB magnets with titanium nitride coating

MATERIALS AND CORROSION/WERKSTOFFE UND KORROSION, Issue 2 2010
A. Ali
Abstract Sintered NdFeB magnets have poor corrosion resistance that renders them susceptible to corrosion in industrial and marine environments. This paper evaluates the properties of cathodic arc physical vapour deposited (CAPVD) titanium nitride coating for corrosion protection of sintered NdFeB permanent magnets. The performance of titanium nitride coating has been compared to the electrodeposited nickel,copper,nickel multilayer coating. The rates of coatings degradation in simulated marine environment were estimated with electrochemical impedance spectroscopy (EIS). Cyclic polarization was carried out to assess the pitting potential. The surface chemistry and coating morphologies were studied with scanning electron microscope (SEM). X-ray diffraction (XRD) was used for qualitative phase analyses of coatings and the substrate. It was figured out that the charge transfer resistance of CAPVD titanium nitride coating increased with exposure time. The negative rate of Rp-degradation for titanium nitride coating compared to the nickel,copper,nickel multilayer for equivalent exposure time is a unique and valuable result. Polarization results showed that ,pits re-passivation' of titanium nitride coating could be responsible for the extended corrosion protection of the NdFeB substrate. The magnetic properties remained comparable for both types of coatings. [source]

Intraoperative Study of Polarization and Evoked Response Signals in Different Endocardial Electrode Designs

PACING AND CLINICAL ELECTROPHYSIOLOGY, Issue 7 2001
CHING LAU
LAU, C., et al.: Intraoperative Study of Polarization and Evoked Response Signals in Different Endocardial Electrode Designs. Some new generation pacemakers use an algorithm based on evoked response (ER) detection to verify beat-to-beat capture and to enable automatic adjustment of output. This is a prospective acute study of polarization signal (PS) and ER in nine currently available electrodes. Intraoperative testing of ventricular bipolar electrodes used the Autocapture (AC) algorithm. The intrinsic R wave, PS, ER, acceptance of AC function, and stimulation thresholds (STs) were obtained. Ventricular electrodes were categorized as follows: titanium nitride (TiN)-coated passive and active fixation, high impedance (HI), passive fixation (VP), iridium oxide-coated titanium (IROX) (VI), and platinum helix (PH) active fixation. Acute testing was performed in 217 patients with an average age of 74.26 years, 59.6% were men with primary pacing indication-SSS (46.3%). There were no significant differences found with respect to R wave and threshold between the various electrodes. PH active-fixation electrodes had significantly higher ER and PS than other groups including the TiN-coated active-fixation electrodes. TiNcoated electrodes (active and passive fixation) had significantly lower PS than other electrodes. As a result, TiN electrodes had a significantly higher functional rate of AC (91.7%), whereas PH had the lowest rate (0%). In conclusion, (1) polarization characteristics are significantly different for commercially available ventricular electrodes, (2) certain physical features at the tissue to electrode interface like TiN coating appears to be more important in determining PS than electrode tip size and fixation method, and (3) the current algorithm for AC requires electrodes that provide low polarization for satisfactory performance. [source]

Effects of substrate bias and argon flux on the structure of titanium nitride films deposited by filtered cathodic arc plasma

PHYSICA STATUS SOLIDI (A) APPLICATIONS AND MATERIALS SCIENCE, Issue 1 2005
Y. J. Zhang
Abstract High-quality titanium nitride (TiN) films with nano-structure were prepared at ambient temperature on (111) silicon substrates by filtered cathodic arc plasma (FCAP) technology with an in-plane "S" filter. The effects of substrate bias and argon flux on the crystal grain size, roughness and preferred orientation were systematically investigated. It was found that the substrate bias and argon flux can affect the properties of TiN films effectively. Transmission electron microscope images showed that the crystal grain size was uniform and ranged from 10 nm to 5 nm. The results of X-ray diffraction and electron diffraction indicated that the degree of preferred orientation was more evident under high substrate bias and high argon flux. (© 2005 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim) [source]

Development of Diamond Machinable Films by Reactive Magnetron Sputtering

PLASMA PROCESSES AND POLYMERS, Issue S1 2007
Christian Schulz
Abstract Thin Ni-doped titanium nitride (Ti-Ni-N) films were deposited on X42Cr13 steel samples by reactive magnetron sputtering. By varying the nitrogen gas flow and target composition, films with different nickel and nitrogen contents were grown with a plastic universal hardness between 7.2 and 17.2 GPa. SEM analysis revealed amorphous, fine crystalline and columnar structure depending on the chemical composition. Furthermore, a contact test was carried out to investigate the reactivity between the film surface and single crystalline diamond. Analysis of the films and the diamond by SEM and EDX showed especially that films with an average nitrogen and nickel content did not react with diamond. [source]

Electrospray ionization and atmospheric pressure matrix-assisted laser desorption/ionization mass spectrometry of antioxidants applied in lubricants,

RAPID COMMUNICATIONS IN MASS SPECTROMETRY, Issue 24 2009
Alexander Kassler
The aim of this study was to investigate the utility of ion trap mass spectrometry (ITMS) in combination with the two desorption/ionization methods, electrospray (ESI) and atmospheric pressure matrix-assisted laser desorption/ionization (AP-MALDI), for the detection of antioxidants which are applied in lubricants. These experiments should form the base for future investigations of antioxidants in tribologically formed thin layers on the surface of frictional systems. Seventeen different antioxidants were selected out of the group of hindered phenolic and aromatic aminic compounds. Practically all antioxidants could be characterized by positive ion ESI- and AP-MALDI-ITMS, forming various types/species of molecular ions (e.g. [M]+., [M+H]+, [M+Na]+ or [M,2H+H]+). A few compounds could be analyzed by negative ion ESI-MS, too, but none by negative ion AP-MALDI-MS. The influence of target materials in AP-MALDI-MS (gold- and titanium nitride (TiN)-covered stainless steel, micro-diamond-covered hard metal, hand-polished and sand-blasted stainless steel targets) with respect to the molecular ion intensity and type of molecular ion of two selected antioxidants was evaluated. The surface properties are of particular interest because in friction tests different materials with different surface characteristics are used. However, the MS results indicate that optimal target surfaces have to be found for individual antioxidants in AP-MALDI-MS but in general smooth surfaces were superior to rough surfaces. Finally the gold-covered stainless steel MALDI target provided the best mass spectra and was selected for all the antioxidants investigated. Copyright © 2009 John Wiley & Sons, Ltd. [source]