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AlN/sapphire Templates (sapphire + templates)
Selected AbstractsTrap states in n-GaN grown on AlN/sapphire template by MOVPEPHYSICA STATUS SOLIDI (C) - CURRENT TOPICS IN SOLID STATE PHYSICS, Issue 9 2008T. Ito Abstract Using epitaxial AlN/sapphire templates, high crystalline quality GaN films are grown on them by metal organic chemical vapour deposition. The electron traps behaviour of these GaN films were observed by deep level transient spectroscopy (DLTS). Four distinct trap levels were ob-served in both n-GaN grown on AlN/sapphire template and on conventional low temperature buffer layer (LT-BL)/sapphire. The magnitude the of the DLTS signal E1 and E2 were almost same. It suggests that E1 is not only associate with dislocation density but also other defect. (© 2008 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim) [source] High temperature growth of AlN film by LP-HVPEPHYSICA STATUS SOLIDI (C) - CURRENT TOPICS IN SOLID STATE PHYSICS, Issue 7 2007K. Tsujisawa Abstract AlN films were grown on AlN/sapphire templates at 1400,1500 °C using low-pressure hydride vapor phase epitaxy (LP-HVPE). Compared to the step-flow growth of AlN film at 1200 °C with growth rate of 2.1 ,m/h, AlN films with atomic steps were obtained at 1400,1500 °C even with high growth rate. For the AlN film grown at 1450 °C with growth rate of 14.3 ,m/h, the RMS value is 0.75 nm and the FWHM values of (0002) and (10-12) X-ray rocking curve (XRC) are 351 and 781 arcsec, respectively. Since the FWHM value of (10-12) XRC for the AlN/sapphire template is 1492 arcsec, the crystal quality of HVPE-grown AlN is greatly improved compared with the AlN/sapphire template, which is also confirmed by TEM observation. (© 2007 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim) [source] Fabrication of thick AlN film by low pressure hydride vapor phase epitaxyPHYSICA STATUS SOLIDI (C) - CURRENT TOPICS IN SOLID STATE PHYSICS, Issue 6 2006Yu-Huai Liu Abstract Thick AlN crystals were grown by conventional hydride vapor phase epitaxy (HVPE) on AlN/sapphire templates under low pressure (,15 Torr) at high temperature (1100 °C,1200 °C). Colorless, mirror-like AlN films were obtained at the growth rates of up to 20.6 ,m/h. The best root mean square (RMS) value of atomic force microscope (AFM) observations for the AlN surface was 0.19 nm in a surface of 5×5 ,m2. The typical values of full width half maximum (FWHM) of X-ray rocking curves for (0002) and (102) diffraction of AlN films were 173,314 arcsec and 1574,1905 arcsec, respectively. We also investigated the influences of carrier gas, growth temperature and growth rate on the crystal quality. (© 2006 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim) [source] Optical properties of InN grown on templates with controlled surface polaritiesPHYSICA STATUS SOLIDI (A) APPLICATIONS AND MATERIALS SCIENCE, Issue 10 2010Ronny Kirste Abstract The structural and optical properties of InN layers grown on GaN/sapphire templates with controlled Ga-/N-polar surfaces are investigated. Raman spectroscopy and XRD reciprocal space map analysis suggest that the InN layers were grown strain free with a high crystal quality. A line shape analysis of the A1(LO) Raman mode yields to a decreasing carrier concentration for the sample grown on Ga-polar substrate. Low temperature photoluminescence measurements exhibit a shift to lower energies of the luminescence maximum for the sample grown on Ga-polar GaN probably due to a reduced carrier concentration and thus, a decreased Burstein,Moss shift. Following this, we demonstrate that the use of polarity controlled GaN/sapphire substrates leads to unstrained layers with good structural and optical properties. [source] | ||||||||||