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Pressure Chemical Vapour Deposition (pressure + chemical_vapour_deposition)
Selected AbstractsTungsten Oxide and Tungsten Oxide-Titania Thin Films Prepared by Aerosol-Assisted Deposition , Use of Preformed Solid NanoparticlesEUROPEAN JOURNAL OF INORGANIC CHEMISTRY, Issue 10 2007Uzma Qureshi Abstract Aerosol-assisted deposition (AAD) was used to deposit films of WO3 from a suspension of solid nanoparticulate WO3 in toluene. Titania films were deposited by the aerosol-assisted chemical vapour deposition of [Ti(OiPr)4] in the presence of WO3 nanoparticles. The WO3 and TiO2 films exhibited photoactivity and photoinduced superhydrophilicity, further the titania films showed very unusual highly crenulated microstructures. These microstructures could not be obtained by sol-gel, atmospheric pressure chemical vapour deposition or evaporation routes. Furthermore, the microstructures could not be obtained from [Ti(OiPr)4] in the absence of nanoparticulate WO3. (© Wiley-VCH Verlag GmbH & Co. KGaA, 69451 Weinheim, Germany, 2007) [source] SHORT COMMUNICATION: Surface passivation by rehydrogenation of silicon-nitride-coated silicon wafersPROGRESS IN PHOTOVOLTAICS: RESEARCH & APPLICATIONS, Issue 3 2005Michelle McCann Abstract A silicon wafer with a silicon nitride layer deposited by low pressure chemical vapour deposition may be subjected to high-temperature treatments without adversely affecting the electronic properties of the silicon on the condition that a thin oxide is present under the nitride. After high-temperature treatments there is an apparent degradation in effective lifetime, probably due to a loss of hydrogen from the silicon/oxide interface. Effective lifetimes can be completely recovered by thermal treatment in a hydrogen-containing ambient. This work has useful applications for solar cells as many of the properties of these nitrides can be used to advantage. Copyright © 2004 John Wiley & Sons, Ltd. [source] TiO2 DLAR coatings for planar silicon solar cellsPROGRESS IN PHOTOVOLTAICS: RESEARCH & APPLICATIONS, Issue 1 2003B. S. Richards Abstract In this paper we demonstrate that a double-layer anti-reflection (DLAR) coating can be fabricated using only titanium dioxide (TiO2). Two TiO2 thin films were deposited onto planar silicon wafers using a simple atmospheric pressure chemical vapour deposition (APCVD) system under different deposition conditions. Weighted average reflectances of 6.5% (measured) and 7.0% (calculated) were achieved for TiO2 DLAR coatings in air and under glass, respectively. An increase in the short-circuit current density of , Jsc,=,2.5,mA/cm2 can be expected for an optimised TiO2 DLAR coating when compared with a commercial TiO2 single-layer anti-reflection coating. Copyright © 2003 John Wiley & Sons, Ltd. [source] Atmospheric pressure deposition of fluorine-doped SnO2 thin films from organotin fluorocarboxylate precursorsAPPLIED ORGANOMETALLIC CHEMISTRY, Issue 5 2005Mary F. Mahon Abstract Nine organotin fluorocarboxylates RnSnO2CRf (n = 3, R = Bu, Rf = CF3, C2F5, C3F7, C7F15; R = Et, Rf = CF3, C2F5; R = Me, Rf = C2F5; n = 2, R = Me, Rf = CF3) have been synthesized; key examples have been used to deposit fluorine-doped SnO2 thin films by atmospheric pressure chemical vapour deposition. Et3SnO2CC2F5, in particular, gives high-quality films with fast deposition rates despite adopting a polymeric, carboxylate-bridged structure in the solid state, as determined by X-ray crystallography. Gas-phase electron diffraction on the model compound Me3SnO2CC2F5 shows that accessible conformations do not allow contact between tin and fluorine, and that direct transfer is therefore unlikely to be part of the mechanism for fluorine incorporation in SnO2 films. The structure of Me2Sn(O2CCF3)2(H2O) has also been determined and adopts a trans -Me2SnO3 coordination sphere about tin in which each carboxylate group is monodentate. Copyright © 2005 John Wiley & Sons, Ltd. [source] | ||||||||||