Nanosphere Lithography (nanosphere + lithography)

Distribution by Scientific Domains


Selected Abstracts


Fabrication of Freestanding Nanoporous Polyethersulfone Membranes Using Organometallic Polymer Resists Patterned by Nanosphere Lithography

ADVANCED MATERIALS, Issue 20 2009
Canet Acikgoz
Freestanding nanoporous polysulfone membranes are fabricated using nanosphere lithography, in which colloidal silica particles act as a template for the organometallic etch resist, which is composed of poly(ferrocenylsilanes). As shown in the figure, the membranes are robust enough to be removed from the silica wafers where they were produced. They can subsequently be used to separate particles of different sizes. [source]


Optical properties of thick metal nanohole arrays fabricated by electron-beam and nanosphere lithography

PHYSICA STATUS SOLIDI (A) APPLICATIONS AND MATERIALS SCIENCE, Issue 5 2009
Ahmad Reza Hajiaboli
Abstract Optically thick metallic nanohole structures were fabricated using two different methods , electron-beam and nanosphere lithography. The nanosphere lithography technique was based on self-assembling of polystyrene or silica nanospheres (0.560,1.25 ,m in diameter) followed by the deposition of a silver film. The holes size and periodicity of the patterns as well as optical properties (transmission and reflection in the Visible,NIR) of the structures were investigated. The extraordinary optical transmission (EOT) was studied experimentally in both structures and it was found to be dependent on the geometrical parameters (holes shape, diameter and periodicity of structures). As the samples were made for long range order, the effect of the defects like missing holes, change of periodicity or variation of the holes shape, were also studied. The experimental results, especially the position of the SPR band in the different nanohole structures, were compared with those found by simulation carried out with 3D FDTD (finite difference time domain). (© 2009 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim) [source]


ZnO nanowire arrays , Pattern generation, growth and applications

PHYSICA STATUS SOLIDI (B) BASIC SOLID STATE PHYSICS, Issue 10 2010
Margit Zacharias
Abstract ZnO nanowires and related materials are in the focus of attention for electronic, optical or sensor applications. However, size, position and arrangement control are essential conditions for the development of future nanowire based devices. Various kinds of template methods including nanosphere lithography and UV laser interference lithography are powerful tools for the preparation of the starting metal catalyst arrays and will be demonstrated and discussed. However, only if the growth mechanism and its guiding parameters are understood in detail, the template will force a pattern arranged growth of nanowires. The paper gives an overview of the various kinds of growth modes for vertical arranged nanowires. Specific experimental conditions establishing the VS or the VLS growth are discussed. In addition, insight is given why the patterning is not all the time conserved and how to overcome these obstacles. In the second part different kinds of applications are summarized. Electronic properties are discussed based on metal,semiconductor,metal devices. The influence of a core,shell nanowire structure on the optical properties is demonstrated. In addition, a simple approach for ZnO nanowire based gas sensors is discussed and shown. As a last example, the transfer of Al2O3 coated nanowires into spinel tubes is reported. [source]