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Lithographic Process (lithographic + process)

Distribution by Scientific Domains
Polymers and Materials Science100%

Selected Abstracts

Fabrication of Advanced Functional Devices Combining Soft Chemistry with X-ray Lithography in One Step

ADVANCED MATERIALS, Issue 48 2009
Paolo Falcaro
Deep X-ray lithography combined with sol,gel techniques offers facile fabrication of controlled patterned films. Using sol,gel, different functional properties can be induced; deep X-ray lithography alters the functionality in the exposed regions. Miniaturized devices based on local property changes are easily fabricated: this technique requires no resist, enabling direct patterning of films in a one-step lithographic process. [source]

Focused-Ion-Beam-Based Selective Closing and Opening of Anodic Alumina Nanochannels for the Growth of Nanowire Arrays Comprising Multiple Elements,

ADVANCED MATERIALS, Issue 13 2008
Nai-Wei Liu
A lithographic process based on focused ion beam bombardment is developed for selectively closing and opening nanochannels on a porous anodic alumina film. This resist-free process is based on the use of focused ion beams with different energies that strike a balance between material sputtering and material relocation. This process is used to selectively grow nanowire patterns of different elements. [source]

Fabricating three-dimensional polymeric photonic structures by multi-beam interference lithography,

POLYMERS FOR ADVANCED TECHNOLOGIES, Issue 2 2006
Jun Hyuk Moon
Abstract The fabrication of true three-dimensional (3D) microstructures both rapidly and economically over a large area with negligible defects is attractive for a wide range of applications. In particular, multi-beam interference lithography is one of the promising techniques that can mass-produce polymeric 3D photonic crystals defect-free over a large area. This review discusses the relationship between beam geometry and the symmetry of the interference patterns, the lithographic process, and various types of photoresist systems, including thick films of negative-tone and positive-tone photoresists, organic-inorganic hybrids, hydrogels, and holographic polymer-dispersed liquid crystals. Copyright © 2006 John Wiley & Sons, Ltd. [source]

Integration of Density Multiplication in the Formation of Device-Oriented Structures by Directed Assembly of Block Copolymer,Homopolymer Blends

ADVANCED FUNCTIONAL MATERIALS, Issue 8 2010
Guoliang Liu
Abstract Non-regular, device-oriented structures can be directed to assemble on chemically nanopatterned surfaces such that the density of features in the assembled pattern is multiplied by a factor of two or more compared to the chemical pattern. By blending the block copolymers with homopolymers and designing the chemical pattern rationally, complicated structures such as bends, jogs, junctions, terminations, and combined structures are fabricated. Previously, directed assembly of block copolymers has been shown to enhance the resolution of lithographic processes for hexagonal arrays of spots and parallel lines, corresponding to the bulk morphologies of block copolymer systems, but this is the first demonstration of enhanced resolution for more complicated, device-oriented features. This fundamental knowledge broadens the range of technologies that can be served by the directed assembly of block copolymers. [source]