Deposition Technology (deposition + technology)

Distribution by Scientific Domains


Selected Abstracts


Aqueous Lithium-ion Battery LiTi2(PO4)3/LiMn2O4 with High Power and Energy Densities as well as Superior Cycling Stability**,

ADVANCED FUNCTIONAL MATERIALS, Issue 18 2007
J.-Y. Luo
Abstract Porous, highly crystalline Nasicon-type phase LiTi2(PO4)3 has been prepared by a novel poly(vinyl alcohol)-assisted sol,gel route and coated by a uniform and continuous nanometers-thick carbon thin film using chemical vapor deposition technology. The as-prepared LiTi2(PO4)3 exhibits excellent electrochemical performance both in organic and aqueous electrolytes, and especially shows good cycling stability in aqueous electrolytes. An aqueous lithium-ion battery consisting of a combination of LiMn2O4 cathode, LiTi2(PO4)3 anode, and a 1 M Li2SO4 electrolyte has been constructed. The cell delivers a capacity of 40 mA,h,g,1 and a specific energy of 60 W,h,kg,1 with an output voltage of 1.5 V based on the total weight of the active electrode materials. It also exhibits an excellent cycling stability with a capacity retention of 82,% over 200 charge/discharge cycles, which is much better than any aqueous lithium-ion battery reported. [source]


Abscheidung von Palladium und Palladiumlegierungen mit hohen Schichtdicken für die Mikrosystemtechnik

MATERIALWISSENSCHAFT UND WERKSTOFFTECHNIK, Issue 2 2007
E. Günther
Palladium and palladium alloys; Heavy deposits are used; Microsystems technology; Internal stress; Graph of current density vs. potential Abstract Die Abscheidung von Metallen und Legierungen in Mikrostrukturen erfordert meist eine Schichtdicke größer als 100 ,m, die der Strukturhöhe entspricht. Für die Nutzung von Edelmetallen in Mikrosystemen ist die Abscheidung von spannungsarmen, rissfreien, porenfreien und duktilen Schichten notwendig. Da die kommerziell abgeschiedenen Edelmetallschichten nur bis etwa 10 ,m qualitätsgerecht abgeschieden werden können, sind geeignete Zusätze und Variation der Abscheidungsbedingungen erforderlich, um mikrosystemtaugliche Elektrolyte zu entwickeln. Charakterisierung der Schichteigenschaften, Parameter der Abscheidungstechnologie und Anwendungsbeispiele werden aufgeführt. Erste Ergebnisse werden vorgestellt und diskutiert. Deposition of Thick Palladium and Palladium Alloy Layers for Microsystems Technology Layers of metals and alloys deposited in microstructures usually require to be thicker than the 100 ,m which is the approximate height of the structure. The deposited form of noble metals used in microsystems must be non-stressed, ductile and free of cracks and pores. As the thickness of layers deposited from commercial noble metal electrolytes will rarely exceed 10 ,m without loss of quality, developing an electrolyte system suitable for microsystems involves finding appropriate additives and deposition parameters. Details are given of deposit characterisation, the parameters of the deposition technology and some practical examples. Initial results are presented and discussed. [source]


High Productive Deposited Mo Layers for Back Ohmic Contacts of Solar Cells

PLASMA PROCESSES AND POLYMERS, Issue S1 2009
Jens-Peter Heinß
Abstract In the paper, thin molybdenum (Mo) layers produced by magnetron sputtering [state of the art in production for photovoltaic applications (PV)] are compared with those produced by high-rate electron beam (EB) deposition technology. Stainless steel and borofloat glass served as substrate materials. Mo layers deposited by DC-magnetron sputtering were produced as a reference and investigated by analysis of structure and specific electrical resistance. Alternative layers prepared by high-rate EB-deposition with a rate up to 240,nm·s,1 were characterised by inquests of mechanical properties, sheet resistance and cell efficiency. A strong dependency of specific electrical resistance on residual gas conditions was determined. The specific electrical resistance dropped from 18 to 11,µ,·cm. Compactness of Mo layers increased with implementation of plasma activation. The layer formation became denser and comparable to the magnetron sputtered Mo layers. [source]


Trends in Combining Techniques for the Deposition of New Application-Tailored Thin Films

PLASMA PROCESSES AND POLYMERS, Issue 3 2007
Gheorghe Dinescu
Abstract A modern approach for the development of thin film deposition technology is to combine the classical principles of PVD and CVD techniques, and to assist them with the recent progress in plasma sources and reactors. The power of inter-combining the deposition methods with new ideas and tools is discussed for a particular number of cases, such as the combination of magnetron sputtering with pulsed ion implantation, of pulsed laser deposition with low-pressure radiofrequency directional plasma beams, and of magnetron sputtering with plasma-beam-enhanced chemical vapor deposition. The discussed cases are complemented with examples from literature, highlighting the recent trends in combining plasma based deposition techniques, and the need for an improvement in the terminology. [source]