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Block Copolymer Thin Films (block + copolymer_thin_film)
Selected AbstractsFabrication of Highly Ordered Silicon Oxide Dots and Stripes from Block Copolymer Thin Films,ADVANCED MATERIALS, Issue 4 2008S. Park A general route to fabricate highly ordered arrays of nanoscopic silicon oxide dots and stripes (see figure) from block copolymer thin films is described. Poly(styrene- b -4-vinylpyridine) thin films with cylindrical microdomains oriented normal and parallel to the surface were used as templates for the fabrication of nanoscopic silicon oxide, with polydimethylsiloxane as the inorganic precursor. [source] Highly Ordered Arrays of Mesoporous Silica Nanorods with Tunable Aspect Ratios from Block Copolymer Thin Films,ADVANCED MATERIALS, Issue 4 2008A. Chen Highly ordered arrays of mesoporous silica nanorods with a tunable aspect ratio can be fabricated using PEOm - b -PMA(Az)n block copolymer thin films as templates. Together, penetration of the films by the silica precursor and the film thickness control the SiO2 nanorod growth, and heights of almost 200,nm can be achieved. Inside the SiO2 nanorods, mesochannels with a diameter of ,,2,nm are formed that are aligned along the longitudinal axis of the rod. [source] Copolymer Film Alignment: Spontaneous Lamellar Alignment in Thickness-Modulated Block Copolymer Films (Adv. Funct.ADVANCED FUNCTIONAL MATERIALS, Issue 16 2009Mater. Self-alignment of lamellar nanodomains is accomplished by imposing thickness modulation to a block copolymer thin film. Real-time atomic-force microscopy imaging reveals that the self-alignment occurs through the directional growth of well-aligned domains along thickness gradients. This novel self-aligning principle, based on a "geometric anchoring" phenomenon, is reported by S. O. Kim, O. D. Lavrentovich and co-workers on page 2584. [source] Fabrication of Highly Ordered Silicon Oxide Dots and Stripes from Block Copolymer Thin Films,ADVANCED MATERIALS, Issue 4 2008S. Park A general route to fabricate highly ordered arrays of nanoscopic silicon oxide dots and stripes (see figure) from block copolymer thin films is described. Poly(styrene- b -4-vinylpyridine) thin films with cylindrical microdomains oriented normal and parallel to the surface were used as templates for the fabrication of nanoscopic silicon oxide, with polydimethylsiloxane as the inorganic precursor. [source] Highly Ordered Arrays of Mesoporous Silica Nanorods with Tunable Aspect Ratios from Block Copolymer Thin Films,ADVANCED MATERIALS, Issue 4 2008A. Chen Highly ordered arrays of mesoporous silica nanorods with a tunable aspect ratio can be fabricated using PEOm - b -PMA(Az)n block copolymer thin films as templates. Together, penetration of the films by the silica precursor and the film thickness control the SiO2 nanorod growth, and heights of almost 200,nm can be achieved. Inside the SiO2 nanorods, mesochannels with a diameter of ,,2,nm are formed that are aligned along the longitudinal axis of the rod. [source] Surface engineering of styrene/PEGylated-fluoroalkyl styrene block copolymer thin filmsJOURNAL OF POLYMER SCIENCE (IN TWO SECTIONS), Issue 1 2009Elisa Martinelli Abstract A series of diblock copolymers prepared from styrenic monomers was synthesized using atom transfer radical polymerization. One block was derived from styrene, whereas the second block was prepared from a styrene modified with an amphiphilic PEGylated-fluoroalkyl side chain. The surface properties of the resulting polymer films were carefully characterized using dynamic contact angle, XPS, and NEXAFS measurements. The polymer morphology was investigated using atomic force microscope and GISAXS studies. The block copolymers possess surfaces dominated by the fluorinated unit in the dry state and a distinct phase separated microstructure in the thin film. The microstructure of these polymers is strongly influenced by the thin film structure in which it is investigated. © 2008 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem 47: 267,284, 2009 [source] | ||||||||||