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Waveguide Devices (waveguide + device)
Kinds of Waveguide Devices Selected AbstractsSSOR preconditioned GMRES for the FEM analysis of waveguide discontinuities with anisotropic dielectricINTERNATIONAL JOURNAL OF NUMERICAL MODELLING: ELECTRONIC NETWORKS, DEVICES AND FIELDS, Issue 2 2004R. S. Chen Abstract The anisotropic media and active properties of the perfectly matched layer (PML) absorbers significantly deteriorate the finite element method (FEM) system condition and as a result, convergence of the iterative solver is substantially slowed down. To address this issue, the symmetric successive over-relaxation (SSOR) preconditioning scheme is applied to the generalized minimal residual (GMRES) for solving a large sparse and non-symmetric system of linear equations resulting from the analysis of ferrite waveguide device by use of edge-based FEM. Consequently, this preconditioned GMRES (PGMRES) approach can reach convergence ten times faster than GMRES for the typical structures. Copyright © 2004 John Wiley & Sons, Ltd. [source] Synthesis of crosslinkable fluorinated polyesters for optical waveguide devicesJOURNAL OF POLYMER SCIENCE (IN TWO SECTIONS), Issue 24 2007Xu Fei Abstract A series of novel crosslinkable, highly fluorinated polyesters were synthesized by copolycondensation reactions of terephthaloyl chloride with 4, 4,-(hexafluoroisopropy-lidene)-diphenol and 2,2,3,3,4,4,5,5,6,6,7,7-dodecafluoro-octane-1,8-diol, followed by reaction with 2-hydroxyethyl methacrylate. The resulting polyesters with the molecular weights (Mn: 12,100,20,000 g mol,1) and polydispersities (1.49,2.25) were useful for the fabrication of polymer optical devices because of their good solubility in common organic solvent and the processable flexibility. The ratios of the components of the polyesters were characterized by FTIR and NMR. The polyesters had high glass transition temperature (Tg,: up to 170 °C) and good thermal stabilities (Td: up to 470 °C). The refractive index of the polyester film was tuned and controlled in the range of 1.447,1.576 at 1550 nm by monitoring the component fractions during the preparation procedures. Low-loss optical waveguides were fabricated from the resulting polyesters and the propagation loss of the channel waveguides was measured to be around 0.56 dB/cm at 1550 nm. © 2007 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem 45: 5923,5931, 2007 [source] Ultrafast laser written active devicesLASER & PHOTONICS REVIEWS, Issue 6 2009M. Ams Abstract Direct-write optical waveguide device fabrication is probably the most widely studied application of femtosecond laser micromachining in transparent dielectrics at the present time. Devices such as buried waveguides, power splitters, couplers, gratings, optical amplifiers and laser oscillators have all been demonstrated. This paper reviews the application of the femtosecond laser direct-write technique to the fabrication of active waveguide devices in bulk glass materials. [source] Study on the formation defect of nano imprinted optical waveguide devices and nano-indentation detectionPOLYMERS FOR ADVANCED TECHNOLOGIES, Issue 12 2008Y.-J. Weng Abstract In this study, we try to discuss the formation defects found in the application of air-assisted soft mold UV-cured nano imprint lithography technology in the manufacture of optical waveguide devices, and find a solution. Meanwhile, we try to utilize the nano-indentation technology in the material quality detection for optical waveguide devices. The results tell us that there is a corresponding relationship between the indentation hardness and procedure parameters under nano-meter level depth. For example, the indentation tends to be harder when it is lowly loaded and shallow in depth. Closer it gets to the edge of waveguide's turning, lower the indentation hardness will be. At the same time, different exposal process results in different structural intensity. Therefore, the high structural intensity without forming defects of optical waveguide with less optical loss and better optical transmission. Copyright © 2008 John Wiley & Sons, Ltd. [source] Fabrication of optical waveguide devices using gas-assisted UV micro/nanoimprinting with soft moldPOLYMERS FOR ADVANCED TECHNOLOGIES, Issue 11 2007Y.-J. Weng Abstract Wavelength limitation and diffraction of light are the bottlenecks encountered in the production of structures by conventional lithography. Nano-imprinting has been a potential process for mass production of nanometer structures at low cost. This paper reports an innovative process to replicate the ridge-shaped microstructures on the silicon mold onto the photoresist using gas-assisted pressing mechanism and soft mold. The microstructures on the silicon mold are replicated unto PC films. The soft mold is obtained by casting the PDMS with the PC film as templates, PDMS mold and UV-curable photoresist are brought into contact, and are pressurized by gas and cured by UV-light at the same time. After curing, structures for optical wave guilding can be obtained, In this process, through the control of gas pressure, the residual layer of the ridge-shaped component for light guilding can eliminated. Etching is no longer needed to get rid of the residual layer. This process is effective for mass production for replication of microstructures at low cost. Copyright © 2007 John Wiley & Sons, Ltd. [source] |