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Probe Lithography (probe + lithography)
Selected AbstractsExploiting Chemical Switching in a Diels,Alder Polymer for Nanoscale Probe Lithography and Data Storage,ADVANCED FUNCTIONAL MATERIALS, Issue 11 2006B. Gotsmann Abstract Reversibly crosslinked polymer films have properties that are beneficial to scanned-probe data storage and lithographic applications that use thermomechanical nanoindentation as a write or expose mechanism. The novel polymer under study contains linkages based on thermally reversible Diels,Alder crosslinking. Thermomechanical properties on the nanometer scale are analyzed by indentation experiments on polymer thin films using heated tips. The underlying indentation mechanism is studied at varying tip temperatures and indentation times, revealing Arrhenius kinetics. This is in contrast to the Williams,Landau,Ferry kinetics usually observed for polymer systems. The discrepancy is explained by the reversible crosslinking incorporated into the structure of the polymer that allows switching between two different states: a rigid, highly crosslinked, low-temperature state, and a deformable, fragmented, high-temperature state. An individual indentation volume of less than 10,20,L (10,000,molecule pairs) is estimated. These kinetics experiments demonstrate that a chemical reaction of only a few thousand molecules can be transduced into a mechanically measurable action. The ability to cycle between two sets of properties in these materials opens up new perspectives in lithography and data storage. Examples of data storage with densities up to 1,Tb,in.,2 and maskless lithography with resolution below 20,nm are demonstrated at writing times of 10,,s per bit/pixel. [source] High-Field Scanning Probe Lithography in Hexadecane: Transitioning from Field Induced Oxidation to Solvent Decomposition through Surface Modification,ADVANCED MATERIALS, Issue 21 2007I. Suez High field scanning probe lithography in hexadecane leads to two different chemical reactions depending on surface hydrophilicity. On a hydrophilic surface, oxidation of the sample occurs; a hydrophobic surface, results in solvent decomposition and nanoscale deposition of etch resistant material. The features are characterized with photoelectron emission microscopy and are carbonaceous in nature with a highly cross-linked bonding network. Tone reversal in a fluorinated etch is achieved. [source] On dot and out of dot electrical characteristics of silicon oxide nanodots patterned by scanning probe lithographyPHYSICA STATUS SOLIDI (C) - CURRENT TOPICS IN SOLID STATE PHYSICS, Issue 4 2009Sabar D. Hutagalung Abstract Silicon oxide nanodot arrays were grown on pre-cleaned silicon (100) substrate by scanning probe nanolithography. In this study, a conductive AFM was used to fabricate nanoscale oxide dots in humidity controlled environment. The AFM is equipped with a nanotechnology software package providing the control of tip-sample voltage and tip motion according to pre-designed patterns. The surface topography and size of obtained patterns (diameter and height) were investigated by a noncontact AFM mode. A series of five silicon oxide nanodot array with diameter in the range of 146.05-247.65 nm and height 2.14-4.87 nm had been successfully fabricated. Meanwhile, a contact AFM mode was used to investigate the localized I-V characteristics on the dots and out of dot position. It was found, the on dot characteristics are highly nonohmic due to potential barrier interface between silicon oxide and silicon substrate. However, the out of dot characteristic is linear indicates an ohmic contact between AFM tip and sample. (© 2009 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim) [source] |