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ALD Cycles (ald + cycle)

Distribution by Scientific Domains
Polymers and Materials Science100%

Selected Abstracts

Deposition of HfO2, Gd2O3 and PrOx by Liquid Injection ALD Techniques,

CHEMICAL VAPOR DEPOSITION, Issue 3 2005
J. Potter
Abstract Thin films of hafnium oxide (HfO2), gadolinium oxide (Gd2O3), and praseodymium oxide (PrOx) have been deposited by liquid injection atomic layer deposition (ALD) and for comparison, have also been deposited by "thermal" metal-organic (MO) CVD using the same reactor. The ALD-grown films were deposited on Si(100) over a range of substrate temperatures (150,450,°C) using alternate pulses of [Hf(mmp)4], [Gd(mmp)3], or [Pr(mmp)3] (mmp = OCMe2CH2OMe) and water vapor. X-ray diffraction (XRD) analysis showed that as-grown films of HfO2 were amorphous, but these crystallized into the monoclinic phase after annealing in air at 800,°C. XRD analysis showed that as-grown Gd2O3 and PrOx films had some degree of crystallinity. Residual carbon (0.8,3.3 at.-%) was detected in the HfO2 and PrOx films by Auger electron spectroscopy (AES), but not in the Gd2O3 films. The self-limiting behavior of the precursors was investigated at 225,°C by varying the volume of precursor injected during each ALD cycle and, in each case, oxide growth was not fully self-limiting. We propose a mechanism for this involving ,-hydride elimination of the mmp group, and also propose some general mechanistic principles which may influence the growth of oxides by ALD using other precursors. [source]

Tuning the Composition and Nanostructure of Pt/Ir Films via Anodized Aluminum Oxide Templated Atomic Layer Deposition

ADVANCED FUNCTIONAL MATERIALS, Issue 18 2010
David J. Comstock
Abstract Nanostructured metal films have been widely studied for their roles in sensing, catalysis, and energy storage. In this work, the synthesis of compositionally controlled and nanostructured Pt/Ir films by atomic layer deposition (ALD) into porous anodized aluminum oxide templates is demonstrated. Templated ALD provides advantages over alternative synthesis techniques, including improved film uniformity and conformality as well as atomic-scale control over morphology and composition. Nanostructured Pt ALD films are demonstrated with morphological control provided by the Pt precursor exposure time and the number of ALD cycles. With these approaches, Pt films with enhanced surface areas, as characterized by roughness factors as large as 310, are reproducibly synthesized. Additionally, nanostructured PtIr alloy films of controlled composition and morphology are demonstrated by templated ALD, with compositions varying systematically from pure Pt to pure Ir. Lastly, the application of nanostructured Pt films to electrochemical sensing applications is demonstrated by the non-enzymatic sensing of glucose. [source]

Tuning the Composition and Nanostructure of Pt/Ir Films via Anodized Aluminum Oxide Templated Atomic Layer Deposition

ADVANCED FUNCTIONAL MATERIALS, Issue 18 2010
David J. Comstock
Abstract Nanostructured metal films have been widely studied for their roles in sensing, catalysis, and energy storage. In this work, the synthesis of compositionally controlled and nanostructured Pt/Ir films by atomic layer deposition (ALD) into porous anodized aluminum oxide templates is demonstrated. Templated ALD provides advantages over alternative synthesis techniques, including improved film uniformity and conformality as well as atomic-scale control over morphology and composition. Nanostructured Pt ALD films are demonstrated with morphological control provided by the Pt precursor exposure time and the number of ALD cycles. With these approaches, Pt films with enhanced surface areas, as characterized by roughness factors as large as 310, are reproducibly synthesized. Additionally, nanostructured PtIr alloy films of controlled composition and morphology are demonstrated by templated ALD, with compositions varying systematically from pure Pt to pure Ir. Lastly, the application of nanostructured Pt films to electrochemical sensing applications is demonstrated by the non-enzymatic sensing of glucose. [source]

Hollow Inorganic Nanospheres and Nanotubes with Tunable Wall Thicknesses by Atomic Layer Deposition on Self-Assembled Polymeric Templates,

ADVANCED MATERIALS, Issue 1 2007

The construction of inorganic nanostructures with hollow interiors is demonstrated by coating self-assembled polymeric nano-objects with a thin Al2O3 layer by atomic layer deposition (ALD), followed by removal of the polymer template upon heating. The morphology of the nano-object (i.e., spherical or cylindrical) is controlled by the block lengths of the copolymer. The thickness of the Al2O3 wall is controlled by the number of ALD cycles. [source]

Atomic Layer Deposition, Characterization, and Dielectric Properties of HfO2/SiO2 Nanolaminates and Comparisons with Their Homogeneous Mixtures,

CHEMICAL VAPOR DEPOSITION, Issue 2-3 2006
L. Zhong
Abstract Nanolaminates of HfO2 and SiO2 were prepared using atomic layer deposition (ALD) methods. Successive exposure of substrates maintained at 120 or 160,°C to nitrogen flows containing Hf(NO3)4 and (tBuO)3SiOH led to typical bilayer spacings of 2.1,nm, with the majority of each bilayer being SiO2. The density of the SiO2 layers (measured using X-ray reflectometry (XRR)) was slightly higher than expected for amorphous silica, suggesting that as much as 10,% HfO2 was incorporated into the silica layers. Based on cross-sectional transmission electron microscopy (TEM) and XRR, oxidation of the silicon substrate was observed during its first exposure to Hf(NO3)4, leading to a SiO2 interfacial layer and the first HfO2 layer. Combining the ALD of Hf(NO3)4/(tBuO)3SiOH with ALD cycles involving Hf(NO3)4 and H2O allowed the systematic variation of the HfO2 thickness within the nanolaminate structure. This provided an approach towards controlling the dielectric constant of the films. The dielectric constant was modeled by treating the nanolaminate as a stack of capacitors wired in series. The nanolaminate structure inhibited the crystallization of the HfO2 in post-deposition annealing treatments. As the HfO2 thickness decreased, the preference for the tetragonal HfO2 phase increased. [source]