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Electroless Deposition (electroless + deposition)
Selected AbstractsFormation of Metal Nano- and Micropatterns on Self-Assembled Monolayers by Pulsed Laser Deposition Through Nanostencils and Electroless Deposition,ADVANCED FUNCTIONAL MATERIALS, Issue 10 2006A. Speets Abstract Patterns of noble-metal structures on top of self-assembled monolayers (SAMs) on Au and SiO2 substrates have been prepared following two approaches. The first approach consists of pulsed laser deposition (PLD) of Pt, Pd, Au, or Cu through nano- and microstencils. In the second approach, noble-metal cluster patterns deposited through nano- and microstencils are used as catalysts for selective electroless deposition (ELD) of Cu. Cu structures are grown on SAMs on both Au and SiO2 substrates and are subsequently analyzed using X-ray photoelectron spectroscopy element mapping, atomic force microscopy, and optical microscopy. The combination of PLD through stencils on SAMs followed by ELD is a new method for the creation of (sub)-micrometer-sized metal structures on top of SAMs. This method minimizes the gas-phase deposition step, which is often responsible for damage to, or electrical shorts through, the SAM. [source] Freestanding Three-Dimensional Copper Foils Prepared by Electroless Deposition on Micropatterned Gels,ADVANCED MATERIALS, Issue 6 2005K. Smoukov Metal foils of complex, three-dimensional topographies are prepared by electroless deposition on surfaces of micropatterned hydrogel supports (see Figure). The foils can either be freestanding or supported by a photocurable polymer. It is possible to selectively metallize different portions of the micropattern embossed on the gel surface, and thus to prepare either continuous or membrane-like metal films. [source] Selective Electroless Deposition of Cu on an Ultrathin Au Film PatternMACROMOLECULAR RAPID COMMUNICATIONS, Issue 22 2004Maofeng Zhang Abstract Summary: In this report an ultrathin Au nanoparticle (AuNP) film composed of photosensitive diazoresin (DR) and mercaptophenol (MP) capped AuNPs (MP-AuNPs) was fabricated by self-assembly (SA). The DR/MP-AuNP film was then patterned through a photomask by selective exposure to UV light and instantly developed in sodium dodecyl sulfate (SDS) aqueous solution. After sintering at 550,°C to remove the organic components, the DR/MP-AuNPs formed AuNPs. Taking advantage of the catalytic susceptibility of AuNPs toward electroless deposition of Cu, a Cu film micropattern with fine resolution (ca. 2,3 ,m) and considerable thickness (ca. 130 nm) was prepared. SEM image of the micropatterned Cu film on a silicon substrate; scale bar: 10 ,m. [source] Electroless Deposition of Soft Magnetic CoNiP Thin Films.CHEMINFORM, Issue 16 2004S. K. Murthy Abstract For Abstract see ChemInform Abstract in Full Text. [source] Direct electrochemical detection of glucose in human plasma on capillary electrophoresis microchipsELECTROPHORESIS, Issue 21-22 2004Yan Du Abstract We developed an electrochemical detector on a hybrid chip for the determination of glucose in human plasma. The microchip system described in this paper consists of a poly(dimethylsiloxane) (PDMS) layer containing separation and injection channels and an electrode plate. The copper microelectrode is fabricated by selective electroless deposition. The fabrication of the decoupler is performed by platinum electrochemical deposition on the metal film formed by electroless deposition. Factors influencing the performance, including detection potential, separation field strength, and buffer concentration, were studied. The electrodes exhibited good stability and durability in the analytical procedures. Under optimized detection conditions, glucose responded linearly from 10 ,M to 1 mM. Finally, glucose in human plasma from three healthy individuals and two diabetics was successfully determined, giving a good prospect for a new clinical diagnostic instrument. [source] Formation of Metal Nano- and Micropatterns on Self-Assembled Monolayers by Pulsed Laser Deposition Through Nanostencils and Electroless Deposition,ADVANCED FUNCTIONAL MATERIALS, Issue 10 2006A. Speets Abstract Patterns of noble-metal structures on top of self-assembled monolayers (SAMs) on Au and SiO2 substrates have been prepared following two approaches. The first approach consists of pulsed laser deposition (PLD) of Pt, Pd, Au, or Cu through nano- and microstencils. In the second approach, noble-metal cluster patterns deposited through nano- and microstencils are used as catalysts for selective electroless deposition (ELD) of Cu. Cu structures are grown on SAMs on both Au and SiO2 substrates and are subsequently analyzed using X-ray photoelectron spectroscopy element mapping, atomic force microscopy, and optical microscopy. The combination of PLD through stencils on SAMs followed by ELD is a new method for the creation of (sub)-micrometer-sized metal structures on top of SAMs. This method minimizes the gas-phase deposition step, which is often responsible for damage to, or electrical shorts through, the SAM. [source] Synthesis of Quasi-Hexagonal Ordered Arrays of Metallic Nanoparticles with Tuneable Particle Size,ADVANCED MATERIALS, Issue 12 2008Theobald Lohmueller Quasi-hexagonal ordered arrays of noble-metal nanoparticles are synthesized by block copolymer micelle nanolithography (BCML) and electroless deposition. Two approaches are discussed to uniformly grow surface-deposited gold, platinum, and palladium nanoparticles independent of interparticle spacing (see figure). The geometrical order of the particles is preserved by either embedding them into a monolayer of alkylsiloxane molecules or using micelles as a stabilizing template. [source] Electrode Grids for ITO Free Organic Photovoltaic Devices,ADVANCED MATERIALS, Issue 19 2007K. Tvingstedt Silver grids are utilized to exclude the expensive use of indium tin oxide (ITO) in conjugated polymer photovoltaic devices. The grids are generated by electroless deposition from elastomeric microfluidic channels onto transparent substrates. The organic photovoltaic devices demonstrated here, with minimized series resistance, are confirmed to have characteristics comparable to devices exploiting ITO. [source] Synthesis of Vertical High-Density Epitaxial Si(100) Nanowire Arrays on a Si(100) Substrate Using an Anodic Aluminum Oxide Template,ADVANCED MATERIALS, Issue 7 2007T. Shimizu Growth of vertical epitaxial Si(100) nanowires on Si(100) substrates is demonstrated (see figure) using a combination of an anodic aluminum oxide template, catalytic Au particles embedded in nanopores directly on the Si substrate by using electroless deposition, and vapor,liquid,solid growth using SiH4. HF acid treatment of the porous alumina template is important to realize a direct contact between deposited Au in the AAO nanopores and the Si substrate. [source] Freestanding Three-Dimensional Copper Foils Prepared by Electroless Deposition on Micropatterned Gels,ADVANCED MATERIALS, Issue 6 2005K. Smoukov Metal foils of complex, three-dimensional topographies are prepared by electroless deposition on surfaces of micropatterned hydrogel supports (see Figure). The foils can either be freestanding or supported by a photocurable polymer. It is possible to selectively metallize different portions of the micropattern embossed on the gel surface, and thus to prepare either continuous or membrane-like metal films. [source] Deposition of PtxRu1,x Catalysts for Methanol Oxidation in Micro Direct Methanol Fuel CellsISRAEL JOURNAL OF CHEMISTRY, Issue 3-4 2008William E. Mustain Platinum-ruthenium electrodes (PtxRu1-x) have been prepared by electrochemical and electroless deposition and investigated as catalysts for the oxidation of methanol in acidic solutions. PtxRu1-x deposits were electrochemically deposited from acidic chloride electrolytes at potentials between ,0.46 and 0.34 V (vs. NHE). The composition of the electrodeposit was estimated by energy dispersive X-ray spectroscopy and is a strong function of the electrode potential. An empirical model for the deposition process is presented and kinetic parameters are estimated and discussed. Also, the methanol oxidation activity of the PtxRu1-x catalysts was characterized by cyclic voltammetry in 1.0 M CH3OH, 1.0 M H2SO4 solutions. Electroless PtxRu1-x samples were prepared in a modified Leaman bath with hydrazine dihydrochloride as the reducing agent. The kinetic results for the electrochemical deposition of PtxRu1-x were directly applied and the deposition potential was estimated as approximately 0.40 V. [source] Selective Electroless Deposition of Cu on an Ultrathin Au Film PatternMACROMOLECULAR RAPID COMMUNICATIONS, Issue 22 2004Maofeng Zhang Abstract Summary: In this report an ultrathin Au nanoparticle (AuNP) film composed of photosensitive diazoresin (DR) and mercaptophenol (MP) capped AuNPs (MP-AuNPs) was fabricated by self-assembly (SA). The DR/MP-AuNP film was then patterned through a photomask by selective exposure to UV light and instantly developed in sodium dodecyl sulfate (SDS) aqueous solution. After sintering at 550,°C to remove the organic components, the DR/MP-AuNPs formed AuNPs. Taking advantage of the catalytic susceptibility of AuNPs toward electroless deposition of Cu, a Cu film micropattern with fine resolution (ca. 2,3 ,m) and considerable thickness (ca. 130 nm) was prepared. SEM image of the micropatterned Cu film on a silicon substrate; scale bar: 10 ,m. [source] Conductive thin film formation onto radiation grafted polymeric surfaces using electroless plating techniquePOLYMERS FOR ADVANCED TECHNOLOGIES, Issue 9 2009Amr El-Hag Ali Abstract Surface modification of polypropylene films (PP) was carried out via radiation induced graft copolymerization of 4-vinyl pyridine (4VP) and acrylamide (AAm) to enhance the adhesion ability of the PP surface for electroless deposition of copper. Factors affecting the grafting process such as suitable solvent, comonomer composition and concentration and irradiation dose were optimized. The grafted films produced were characterized by studying their Fourier-transform infrared (FTIR) spectra and thermal stability. The grafted films were copper-plated by electroless deposition using Pd as the catalyst to initiate the redox reaction. The influence of catalytic activation method parameters on the plating rate were studied. Scanning electron microscopy revealed a dense and void-free copper deposited film. The adhesion of the deposited copper film to the modified PP films was determined by measuring the tensile strength of the copper plated films. The electrical characteristics of the copper plated films in comparison with grafted films were studied. The results showed the high adhesion of the deposited copper film to the grafted PP film as well as the high electrical conductivity. Copyright © 2008 John Wiley & Sons, Ltd. [source] Selectively Deposited Silver Coatings on Gold-Capped Silicon Nanowires for Surface-Enhanced Raman SpectroscopyCHEMPHYSCHEM, Issue 8 2009M. Becker Dr. Abstract Gold caps on silicon nanowires are selectively coated with silver by autometallography (electroless deposition). Changing the conditions of silver deposition, a variety of different coating morphologies can be produced (see figure). The different silver coating morphologies are investigated in terms of their capabilities for surface enhanced Raman scattering (SERS) experiments. Gold caps on silicon nanowires are hemispherical and only a few tens of nanometers in diameter when grown from metal catalysts by the vapor-liquid-solid growth mechanism using chemical vapor deposition. These gold caps are capable of enhancing Raman signals based on the surface-enhanced Raman scattering effect. The Raman signal can be enhanced even further (by at least one order of magnitude) when silver is selectively deposited onto these gold caps by autometallography (electroless deposition). By changing the silver deposition conditions, different coating morphologies can be realized on the gold caps that range from very thin, smooth layers to uneven and extremely rough coatings. The SERS signal enhancement and the spatial homogeneity of the achievable enhancement are compared for the different silver coatings using a model dye molecule. [source] A New Approach on the Active Treatment for Electroless Copper Plating on GlassCHINESE JOURNAL OF CHEMISTRY, Issue 1 2003Liu Zheng-Chun Abstract A new method is described for the electroless deposition of copper onto glass. Commercially available glass slide was modified with ,-amimopropyltrimethoxysilane to form self-assembled monolayer (SAM) on it. Then it was dipped directly into PdCl2 solution instead of the conventional SnCl2 sensitization followed by PdCl2 activation. Experimental results showed that the Pd2+ ions from PdCl2 solution were coordinated to the ammo groups on the glass surface resulting in the formation of N,Pd complex. In an electroless copper bath containing a formaldehyde reducing agent, the N,Pd complexes were reduced to Pd0 atoms, which then acted as catalysts and initiated the deposition of copper metal. Although the copper deposition rate on SAM-modified glass was slow at the beginning, it reached to that of conventional method in about 5 min. [source] | |||||||||||||